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Contains over 80 methods for the analysis of trace elements in a wide range of sample types across a wide range of industries.
- Publication Part Number: 5991-2802EN
- Created: 04 July 2022
- 28 MB
Online calibration using the IAS Automated Standard Addition System (ASAS)
- Publication Part Number: 5994-0273EN
- Created: 07 June 2022
- 1 MB
| Japanese (Japan) | Complete (PDF) |
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Laboratory setup and configuration requirements
- Publication Part Number: 8510119300
- Created: 23 May 2022
- 974 KB
Metallic impurities in trichlorosilane (TCS), an intermediate product used in the production of photovoltaic (PV) silicon, must be strictly controlled in order to produce...
- Publication Part Number: 5990-8175EN
- Created: 20 Sep 2021
- 427 KB
| Chinese (Simplified) (China) | Complete (PDF) |
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Single-digit ppb detection limits for hydride gas contaminants using a single column, single injection volume, and multi-tune method
- Publication Part Number: 5994-2213EN
- Created: 30 Sep 2020
- 499 KB
This application brief describes a study that used the exceptional sensitivity and low background of the Agilent 8900 ICP-QQQ to analyze Fe nanoparticles in organic solvents.
- Publication Part Number: 5994-1747EN
- Created: 04 Mar 2020
- 212 KB
| Japanese (Japan) | Complete (PDF) |
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Low-ppt determination of alkali metals in high matrix samples using the optional "m-lens"
- Publication Part Number: 5994-0383EN
- Created: 15 Nov 2018
- 935 KB
| Chinese (Simplified) (China) | Complete (PDF) |
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Online MSA calibration using prepFAST S automated sample introduction and Agilent 8900 ICP-QQQ
- Publication Part Number: 5991-9487EN
- Created: 06 June 2018
- 548 KB
| Chinese (Simplified) (China) | Complete (PDF) |
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Illustrates the advanced analytical performance and robustness of the Agilent 7700s/7900 ICP-MS for the direct determination of metallic impurities in high purity concentrated HCl.
- Publication Part Number: 5990-7354EN
- Created: 02 Oct 2017
- 447 KB
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| Chinese (Simplified) (China) | Complete (PDF) |
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The performance of the 8900 ICP-QQQ for the analysis of some of the most challenging elements for ICP-MS: phosphorus, sulfur, silicon, and chlorine
- Publication Part Number: 5991-6852EN
- Created: 01 June 2016
- 505 KB
The Agilent 5100 Synchronous Vertical Dual (SVDV) revolutionizes ICP-OES analysis. Learn how SVDV works with unique Dichroic Spectral combiner technology.
- Created: 06 Nov 2015
- 575 KB
Agilent’s Fitted Background Correction (FBC) takes the guesswork out of background correction. No matter what your sample challenge may be.
- Created: 06 Nov 2015
- 409 KB
Application note for monitoring heavy metals by atomic absorption spectroscopy for compliance with RoHS and WEEE Directives
- Publication Part Number: SI-A-1142
- Created: 27 Jan 2014
- 82 KB
TN
- Publication Part Number: SI-A-1409
- Created: 25 Sep 2012
- 171 KB
This technology brief describes the advantages that Agilent ICP-MS instruments offer for elemental analysis in the semiconductor industry.
- Publication Part Number: 5994-1907EN
- Created: 29 July 2020
- 338 KB
Learn the reasons why the Agilent 7900s single quadrupole ICP-MS is ideal for measuring contaminants in semiconductor manufacturing chemicals
- Publication Part Number: 5994-1840EN
- Created: 29 July 2020
- 356 KB
PPT-level impurity analysis of 49 elements in 0.1% high purity copper sample using simple one tuning mode on ICP-QQQ
- Created: 03 Mar 2017
- 635 KB
The Agilent 8900 ICP-MS-QQQ adds MS/MS mode making it the world’s most powerful and flexible multi-element analyzer.
- Publication Part Number: 5991-6994EN
- Created: 01 June 2016
- 1 MB
| German (Germany) | Complete (PDF) |
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| Portuguese (Brazil) | Complete (PDF) |
| Italian (Italy) | Complete (PDF) |
Newsletter for ICP-MS Journal, May 2013, Issue 53
- Publication Part Number: 5991-2209EN
- Created: 06 May 2013
- 9 MB
ICP-MS Journal, January 2013, Issue 52
- Created: 28 Jan 2013
- 757 KB