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Contains over 80 methods for the analysis of trace elements in a wide range of sample types across a wide range of industries.
Online calibration using the IAS Automated Standard Addition System (ASAS)
| Japanese (Japan) | Complete (PDF) |
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Metallic impurities in trichlorosilane (TCS), an intermediate product used in the production of photovoltaic (PV) silicon, must be strictly controlled in order to produce...
| Chinese (Simplified) (China) | Complete (PDF) |
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Single-digit ppb detection limits for hydride gas contaminants using a single column, single injection volume, and multi-tune method
This application brief describes a study that used the exceptional sensitivity and low background of the Agilent 8900 ICP-QQQ to analyze Fe nanoparticles in organic solvents.
| Japanese (Japan) | Complete (PDF) |
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Low-ppt determination of alkali metals in high matrix samples using the optional "m-lens"
| Chinese (Simplified) (China) | Complete (PDF) |
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Online MSA calibration using prepFAST S automated sample introduction and Agilent 8900 ICP-QQQ
| Chinese (Simplified) (China) | Complete (PDF) |
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Illustrates the advanced analytical performance and robustness of the Agilent 7700s/7900 ICP-MS for the direct determination of metallic impurities in high purity concentrated HCl.
| Publication Part Number | 5990-7354EN | ||
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| Chinese (Simplified) (China) | Complete (PDF) |
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The performance of the 8900 ICP-QQQ for the analysis of some of the most challenging elements for ICP-MS: phosphorus, sulfur, silicon, and chlorine
This technology brief describes the advantages that Agilent ICP-MS instruments offer for elemental analysis in the semiconductor industry.
Learn the reasons why the Agilent 7900s single quadrupole ICP-MS is ideal for measuring contaminants in semiconductor manufacturing chemicals
PPT-level impurity analysis of 49 elements in 0.1% high purity copper sample using simple one tuning mode on ICP-QQQ
The Agilent 8900 ICP-MS-QQQ adds MS/MS mode making it the world’s most powerful and flexible multi-element analyzer.
| German (Germany) | Complete (PDF) |
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| Portuguese (Brazil) | Complete (PDF) |
| Italian (Italy) | Complete (PDF) |
Newsletter for ICP-MS Journal, May 2013, Issue 53
ICP-MS Journal, January 2013, Issue 52
A guide to measuring trace elements and metal contaminants in semiconductor fabrication
Learn about the Agilent range of AA, MP-AES, ICP-OES, ICP-MS and ICP-QQQ instruments
| French (France) | Complete (PDF) |
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| Russian (Russia) | Complete (PDF) |
| Russian (Russia) | Complete (PDF) |
Characterization of Ag, Fe3O4, Al2O3, Au, and SiO2 NPs in TMAH in a single analytical run
| Chinese (Simplified) (China) | Complete (PDF) |
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半導(dǎo)體級(jí) H2O2 中超痕量元素雜質(zhì)的測(cè)定
使用 MS/MS 模式分析 HCl 中的 50 種元素來解決多原子干擾問題。所有分析物都可直接在未稀釋的 HCl 中測(cè)定，檢測(cè)限可達(dá)到個(gè)位數(shù) ppt 級(jí)。