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A guide to the applications of ICP-MS in the semiconductor industry, including the control of metal contaminants.
| Chinese (Simplified) (China) | Complete (PDF) |
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Laboratory setup and configuration requirements
Determination of 25 and 30 nm Fe3O4 NPs in low-particle concentration solutions
Characterization of Ag, Fe3O4, Al2O3, Au, and SiO2 NPs in TMAH in a single analytical run
| Japanese (Japan) | Complete (PDF) |
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| Chinese (Simplified) (China) | Complete (PDF) |
Low-ppt determination of alkali metals in high matrix samples using the optional "m-lens"
| Chinese (Simplified) (China) | Complete (PDF) |
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Online MSA calibration using prepFAST S automated sample introduction and Agilent 8900 ICP-QQQ
| Chinese (Simplified) (China) | Complete (PDF) |
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Direct analysis of sub-ppt to ppt levels of 49 elements in undiluted HNO3 by triple quadrupole ICP-MS (ICP-QQQ).
| Chinese (Simplified) (China) | Complete (PDF) |
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50 elements in HCl were analysed using MS/MS mode to resolve the polyatomic interferences. All analytes could be determined directly in the undiluted HCl with single digit ppt detection limits.
| Chinese (Simplified) (China) | Complete (PDF) |
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Illustrates the advanced analytical performance and robustness of the Agilent 7700s/7900 ICP-MS for the direct determination of metallic impurities in high purity concentrated HCl.
| Publication Part Number | 5990-7354EN | ||
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| Chinese (Simplified) (China) | Complete (PDF) |
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Detection limits in the single digit ppt or sub-ppt range were obtained for 48 elements, demonstrating the ability of the 7700s/7900 to routinely measure trace contaminants.
| Publication Part Number | 5990-7914EN | ||
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| Chinese (Simplified) (China) | Complete (PDF) |
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Determination of ultra trace levels of elemental impurities in semiconductor grade H2O2.
| Chinese (Simplified) (China) | Complete (PDF) |
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Intuvo Method for Sulfur Compounds following ASTM Method D5623
The Agilent 5100 Synchronous Vertical Dual (SVDV) revolutionizes ICP-OES analysis. Learn how SVDV works with unique Dichroic Spectral combiner technology.
The Agilent 5100 Synchronous Vertical Dual (SVDV) revolutionizes ICP-OES analysis. Learn how SVDV works with unique Dichroic Spectral combiner technology.
Agilent’s Fitted Background Correction (FBC) takes the guesswork out of background correction. No matter what your sample challenge may be.
Application note for Determination of challenging elements in ultrapure semiconductor grade sulfuric acid by Triple Quadrupole ICP-MS
| Chinese (Simplified) (China) | Complete (PDF) |
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Combining signals from two DADs with different path length flow cells, the 1200 Infinity Series HDR-DAD Analyzer enables analysis of main and trace compounds in a single run
Learn about the benefits of a vertically oriented torch—fast, accurate results, even for your toughest samples
This Technical Overview describes a LC system with 3 detectors in a multi-user environment operated with Agilent MassHunter Walkup Software for LC/MS and LC systems.
Application note for Trace level analysis of sulfur, phosphorus, silicon and chlorine in NMP using the Agilent 8800 Triple Quadrupole ICP-MS
| Chinese (Simplified) (China) | Complete (PDF) |
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