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Online calibration using the IAS Automated Standard Addition System (ASAS)
- Publication Part Number: 5994-0273EN
- Created: 07 June 2022
- 1 MB
| Japanese (Japan) | Complete (PDF) |
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Single-digit ppb detection limits for hydride gas contaminants using a single column, single injection volume, and multi-tune method
- Publication Part Number: 5994-2213EN
- Created: 30 Sep 2020
- 499 KB
This application brief describes a study that used the exceptional sensitivity and low background of the Agilent 8900 ICP-QQQ to analyze Fe nanoparticles in organic solvents.
- Publication Part Number: 5994-1747EN
- Created: 04 Mar 2020
- 212 KB
| Japanese (Japan) | Complete (PDF) |
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Low-ppt determination of alkali metals in high matrix samples using the optional "m-lens"
- Publication Part Number: 5994-0383EN
- Created: 15 Nov 2018
- 935 KB
| Chinese (Simplified) (China) | Complete (PDF) |
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Online MSA calibration using prepFAST S automated sample introduction and Agilent 8900 ICP-QQQ
- Publication Part Number: 5991-9487EN
- Created: 06 June 2018
- 548 KB
| Chinese (Simplified) (China) | Complete (PDF) |
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Illustrates the advanced analytical performance and robustness of the Agilent 7700s/7900 ICP-MS for the direct determination of metallic impurities in high purity concentrated HCl.
- Publication Part Number: 5990-7354EN
- Created: 02 Oct 2017
- 447 KB
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| Chinese (Simplified) (China) | Complete (PDF) |
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This technology brief describes the advantages that Agilent ICP-MS instruments offer for elemental analysis in the semiconductor industry.
- Publication Part Number: 5994-1907EN
- Created: 29 July 2020
- 338 KB
Learn the reasons why the Agilent 7900s single quadrupole ICP-MS is ideal for measuring contaminants in semiconductor manufacturing chemicals
- Publication Part Number: 5994-1840EN
- Created: 29 July 2020
- 356 KB
PPT-level impurity analysis of 49 elements in 0.1% high purity copper sample using simple one tuning mode on ICP-QQQ
- Created: 03 Mar 2017
- 635 KB
A guide to measuring trace elements and metal contaminants in semiconductor fabrication
- Publication Part Number: 5994-1841EN
- Created: 12 Aug 2020
- 2 MB
Learn about the Agilent range of AA, MP-AES, ICP-OES, ICP-MS and ICP-QQQ instruments
- Publication Part Number: 5990-6443ITE
- Created: 21 July 2021
- 465 KB
| French (France) | Complete (PDF) |
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| Russian (Russia) | Complete (PDF) |
| Russian (Russia) | Complete (PDF) |
Characterization of Ag, Fe3O4, Al2O3, Au, and SiO2 NPs in TMAH in a single analytical run
- Publication Part Number: 5994-0987JAJP
- Created: 27 June 2019
- 1 MB
| Chinese (Simplified) (China) | Complete (PDF) |
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半導(dǎo)體級 H2O2 中超痕量元素雜質(zhì)的測定
- Publication Part Number: 5991-7701ZHCN
- Created: 19 Apr 2019
- 383 KB
使用 MS/MS 模式分析 HCl 中的 50 種元素來解決多原子干擾問題。所有分析物都可直接在未稀釋的 HCl 中測定,檢測限可達(dá)到個(gè)位數(shù) ppt 級。
- Publication Part Number: 5991-8675ZHCN
- Created: 19 Apr 2019
- 467 KB
通過串聯(lián)四極桿 ICP-MS (ICP-QQQ) 直接分析未稀釋的 HNO3 中亞 ppt 至 ppt 水平的 49 種元素。
- Publication Part Number: 5991-8798ZHCN
- Created: 19 Apr 2019
- 476 KB
在本研究中,Agilent 8900 ICP-MS/MS 用于分析硫酸中的 42 種分析物,包括 Ti 和其他元素,這些元素難以在高硫基質(zhì)中以痕量水平測定。
- Publication Part Number: 5991-7008ZHCN
- Created: 20 Mar 2019
- 390 KB
The Agilent 8900 ICP-MS-QQQ adds MS/MS mode making it the world’s most powerful and flexible multi-element analyzer.
- Publication Part Number: 5991-6994DEE
- Created: 05 July 2016
- 429 KB
| Portuguese (Brazil) | Complete (PDF) |
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| Italian (Italy) | Complete (PDF) |