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Agilent 8900 ICP-QQQ integrated with IAS Expert PS VPD provides the sensitivity and robustness required for 24/7 contamination control of wafers
| Japanese (Japan) | Complete (PDF) |
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| Korean (Korea) | Complete (PDF) |
Application note for investigating the angular dependence of absolute specular reflection using the Agilent Cary 7000 UMS.
| Japanese (Japan) | Complete (PDF) |
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| Korean (Korea) | Complete (PDF) |
| Chinese (Simplified) (China) | Complete (PDF) |
Application note for a faster, more accurate way of characterizing cube beamsplitters using the Agilent Cary 7000 Universal Measurement Spectrophotometer (UMS).
| Japanese (Japan) | Complete (PDF) |
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| Chinese (Simplified) (China) | Complete (PDF) |
| Korean (Korea) | Complete (PDF) |
Laboratory setup and configuration requirements
Metallic impurities in trichlorosilane (TCS), an intermediate product used in the production of photovoltaic (PV) silicon, must be strictly controlled in order to produce...
| Chinese (Simplified) (China) | Complete (PDF) |
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| Korean (Korea) | Complete (PDF) |
Illustrates the advanced analytical performance and robustness of the Agilent 7700s/7900 ICP-MS for the direct determination of metallic impurities in high purity concentrated HCl.
| Publication Part Number | 5990-7354EN | ||
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| Chinese (Simplified) (China) | Complete (PDF) |
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The Agilent 5100 Synchronous Vertical Dual (SVDV) revolutionizes ICP-OES analysis. Learn how SVDV works with unique Dichroic Spectral combiner technology.
The Agilent 5100 Synchronous Vertical Dual (SVDV) revolutionizes ICP-OES analysis. Learn how SVDV works with unique Dichroic Spectral combiner technology.
Agilent’s Fitted Background Correction (FBC) takes the guesswork out of background correction. No matter what your sample challenge may be.
Analyzing the purity of isopropyl via Microwave Plasma Atomic Emission Spectroscopy (MP-AES).
| Chinese (Simplified) (China) | Complete (PDF) |
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Application note for Determination of challenging elements in ultrapure semiconductor grade sulfuric acid by Triple Quadrupole ICP-MS
| Chinese (Simplified) (China) | Complete (PDF) |
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Learn about the benefits of a vertically oriented torch—fast, accurate results, even for your toughest samples
Application note for Improvement of ICP-MS detectability of phosphorus and titanium in high purity silicon samples using the Agilent 8800 Triple Quadrupole ICP-MS
| Chinese (Simplified) (China) | Complete (PDF) |
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This Technical Overview describes a LC system with 3 detectors in a multi-user environment operated with Agilent MassHunter Walkup Software for LC/MS and LC systems.
安捷倫科技從未停止對更快、更智能的 CCD 檢測器系列的創(chuàng)新和研發(fā)。
Application note for Trace level analysis of sulfur, phosphorus, silicon and chlorine in NMP using the Agilent 8800 Triple Quadrupole ICP-MS
| Chinese (Simplified) (China) | Complete (PDF) |
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Basic Performance of the Agilent 7700s ICP-MS for the Analysis of Semiconductor Samples
| Publication Part Number | 5990-6195EN | ||
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| Analysis | Analysed with Part No. |
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A new quantitative method for the determination of ultratrace elemental impurities present in photovoltaic grade silicon is described using the Agilent 7500cs ICP-MS
| Chinese (Simplified) (China) | Complete (PDF) |
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Learn the reasons why the Agilent 7900s single quadrupole ICP-MS is ideal for measuring contaminants in semiconductor manufacturing chemicals